Nickel - target

Origin: Baoji, Shaanxi, China Brand: FRL Metal Name: Nickel Target Grade: N0200 N0201 Density: 8.9g/cm³ Size: Customized Standards: ASTM, DIN, EN Production Process: Hot Rolled, Cold Rolled Surface Treatment: Pickled/Bright Certification: ISO9001 Delivery Time: 5-7 days Payment Method: Wire Transfer (T/T) Packaging: Standard Packaging
Product Description

Nickel sputtering targets are sputtering targets made from high-purity nickel or nickel-based alloys through processes such as vacuum melting, precision machining, and heat treatment. They are mainly used in thin film deposition processes such as magnetron sputtering (PVD) and are core coating materials in fields such as electronic semiconductors, display panels, new energy, and magnetic materials.

Standard Sizes:

Planar Target: φ50~300mm, Thickness 3~15mm.

Rotating Target: Length 300~4000mm, Outer Diameter 125~250mm.

Core Indicators: Density ≥8.9g/cm³ (close to theoretical density), Grain Size 5~50μm, Hardness 100~150HV.

IV. Core Application Areas

Semiconductors and Integrated Circuits: Copper interconnect adhesion layer/seed layer, diffusion barrier layer, contact electrode, encapsulation pad.

Display Panels: TFT-LCD/OLED gate, source/drain electrode, electrode wiring (commonly molybdenum-nickel alloy).

Magnetic Storage and Magnetic Devices: Hard disk magnetic layer, magnetic head, magnetic sensor, soft magnetic film (NiFe).

New Energy: Solar cell back electrode, lithium battery current collector, fuel cell catalyst layer.

Functional and Decorative Coatings: Wear-resistant and corrosion-resistant coatings, hardware/jewelry PVD coating, glass low-emissivity film.

V. Production and Quality Standards

Process: Vacuum induction melting → Hot forging/rolling → Heat treatment → Precision machining → Cleaning and bonding → Inspection and packaging.

Standards: National Standard GB/T 2056, American Standard ASTM B160, Semiconductor Standard SEMI F72.

Testing: Full elemental analysis, density/hardness/grain size, ultrasonic flaw detection, surface roughness.

VI. Product Advantages

High film quality: Uniform and dense, low stress, no pinholes, strong adhesion.

Stable sputtering: Long target life, good process repeatability, high utilization rate (rotating target can reach 70%+).

Customizable purity: 3N~5N full coverage, meeting the needs of all scenarios from industrial to ultra-clean electronics.

Environmentally friendly and efficient: PVD process replaces traditional electroplating, with less pollution and controllable precision.

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Quality Control and Testing

Each product undergoes rigorous inspection before shipment:

Dimensional Inspection: Precise measurement of thickness, length, and width

Chemical Composition and Mechanical Property Analysis: Third-party testing reports

Surface Inspection: Visual and microscopic inspection for defects

Ultrasonic Testing: Detection of internal defects

Why Choose Us

Technology and Quality: Located in Baoji, China's Titanium Valley, we possess professional production technology and extensive experience in non-ferrous metal manufacturing.

Global Coverage: We provide consistently high-quality products to customers in Australia, South Korea, Germany, the USA, the UK, Malaysia, and the Middle East.

Quality Commitment: We never compromise on quality and are responsible for every product we manufacture.

Technical Support: We have professional personnel overseeing the entire process from raw materials to finished products!

Contact Us
Our team is dedicated to serving you and hopes that every product you purchase will meet your expectations!

Email: lucky@bjfreelong.com

WhatsApp: +13369210303

Please contact us for detailed quotations and technical specifications. We look forward to becoming your trusted high-end titanium materials partner.

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